Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass
Gespeichert in:
Veröffentlicht in: | Journal of the Electrochemical Society 1972, Vol.119 (4), p.545 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | 4 |
container_start_page | 545 |
container_title | Journal of the Electrochemical Society |
container_volume | 119 |
creator | Brooks, A. D. Donovan, R. P. Hardesty, C. A. |
description | |
doi_str_mv | 10.1149/1.2404250 |
format | Article |
fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_2404250</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1149_1_2404250</sourcerecordid><originalsourceid>FETCH-LOGICAL-c194t-9b0cee43d4b6963978da23084cc6defe5f473bd9c65d1df3b123801c46b5d4383</originalsourceid><addsrcrecordid>eNotULFOwzAU9AASpTDwB14ZXPziFyceoSoFKRJD2oEpcuwXFJQ2le0K8fekItPdSXen0zH2AHIFgOYJVhlKzHJ5xRZSghKoc7hhtzF-TxJKLBbssxp_xI4OJwo2nQPxzUAuhTEmm3rH637o3XgUaRQz5TXZIfJ97I9fvD6dU6JAnr-MU-bisIn4drAx3rHrbnLS_YxLtn_d7NZvovrYvq-fK-HAYBKmlY4IlcdWG61MUXqbKVmic9pTR3mHhWq9cTr34DvVQqZKCQ51m3tUpVqyx_9eNy2IgbrmFPqDDb8NyObyQwPN_IP6A3H_UuI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass</title><source>IOP Publishing Journals</source><creator>Brooks, A. D. ; Donovan, R. P. ; Hardesty, C. A.</creator><creatorcontrib>Brooks, A. D. ; Donovan, R. P. ; Hardesty, C. A.</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>DOI: 10.1149/1.2404250</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 1972, Vol.119 (4), p.545</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c194t-9b0cee43d4b6963978da23084cc6defe5f473bd9c65d1df3b123801c46b5d4383</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4010,27900,27901,27902</link.rule.ids></links><search><creatorcontrib>Brooks, A. D.</creatorcontrib><creatorcontrib>Donovan, R. P.</creatorcontrib><creatorcontrib>Hardesty, C. A.</creatorcontrib><title>Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass</title><title>Journal of the Electrochemical Society</title><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1972</creationdate><recordtype>article</recordtype><recordid>eNotULFOwzAU9AASpTDwB14ZXPziFyceoSoFKRJD2oEpcuwXFJQ2le0K8fekItPdSXen0zH2AHIFgOYJVhlKzHJ5xRZSghKoc7hhtzF-TxJKLBbssxp_xI4OJwo2nQPxzUAuhTEmm3rH637o3XgUaRQz5TXZIfJ97I9fvD6dU6JAnr-MU-bisIn4drAx3rHrbnLS_YxLtn_d7NZvovrYvq-fK-HAYBKmlY4IlcdWG61MUXqbKVmic9pTR3mHhWq9cTr34DvVQqZKCQ51m3tUpVqyx_9eNy2IgbrmFPqDDb8NyObyQwPN_IP6A3H_UuI</recordid><startdate>1972</startdate><enddate>1972</enddate><creator>Brooks, A. D.</creator><creator>Donovan, R. P.</creator><creator>Hardesty, C. A.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>1972</creationdate><title>Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass</title><author>Brooks, A. D. ; Donovan, R. P. ; Hardesty, C. A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c194t-9b0cee43d4b6963978da23084cc6defe5f473bd9c65d1df3b123801c46b5d4383</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1972</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Brooks, A. D.</creatorcontrib><creatorcontrib>Donovan, R. P.</creatorcontrib><creatorcontrib>Hardesty, C. A.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Brooks, A. D.</au><au>Donovan, R. P.</au><au>Hardesty, C. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>1972</date><risdate>1972</risdate><volume>119</volume><issue>4</issue><spage>545</spage><pages>545-</pages><issn>0013-4651</issn><doi>10.1149/1.2404250</doi><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0013-4651 |
ispartof | Journal of the Electrochemical Society, 1972, Vol.119 (4), p.545 |
issn | 0013-4651 |
language | eng |
recordid | cdi_crossref_primary_10_1149_1_2404250 |
source | IOP Publishing Journals |
title | Low-Temperature Electrostatic Silicon-to-Silicon Seals Using Sputtered Borosilicate Glass |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T15%3A13%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-Temperature%20Electrostatic%20Silicon-to-Silicon%20Seals%20Using%20Sputtered%20Borosilicate%20Glass&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Brooks,%20A.%20D.&rft.date=1972&rft.volume=119&rft.issue=4&rft.spage=545&rft.pages=545-&rft.issn=0013-4651&rft_id=info:doi/10.1149/1.2404250&rft_dat=%3Ccrossref%3E10_1149_1_2404250%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |