The Field-Dependence of the Dielectric Constant during the Anodic Oxidation of Tantalum, Niobium, and Tungsten
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| Veröffentlicht in: | J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972) 439-45(Apr 1972), 1972, Vol.119 (4), p.439 |
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| container_issue | 4 |
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| container_title | J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972) |
| container_volume | 119 |
| creator | Ord, J. L Hopper, M. A. Wang, W. P. |
| description | |
| doi_str_mv | 10.1149/1.2404226 |
| format | Article |
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Soc. 119: No. 4, 439-45(Apr 1972)</title><subject>ANODIZATION</subject><subject>DIELECTRIC PROPERTIES</subject><subject>ELECTRIC FIELDS</subject><subject>MEASURING METHODS</subject><subject>N50210 -Metals, Ceramics, & Other Materials-Metals & Alloys-Corrosion & Erosion & Surface Phenomena</subject><subject>NIOBIUM</subject><subject>NIOBIUM/oxide film formation on, field-dependence of dielectric constant during anodic</subject><subject>OXIDATION</subject><subject>REFRACTION</subject><subject>TANTALUM</subject><subject>TANTALUM/oxide film formation on, field- dependence of dielectric constant during anodic</subject><subject>TUNGSTEN</subject><subject>TUNGSTEN/oxide film formation on, field-dependence of dielectric constant during anodic</subject><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1972</creationdate><recordtype>article</recordtype><recordid>eNotkEFPAyEQhTloYq0e_AfEm4lbYReW3WPTWjVp7GU9ExaGFtNCs7CJ_nup7Wlm3vtmknkIPVAyo5S1L3RWMsLKsr5CE0JoVbCa0xt0G-N3HmnDxAT5bgd45WBviiUcwRvwGnCwOGV9mXXQaXAaL4KPSfmEzTg4v_235z6YbG1-nFHJBX9a6zKj9uPhGX-60LtTo7zB3ei3MYG_Q9dW7SPcX-oUfa1eu8V7sd68fSzm60JXJUlF2zDbaKIEV73lgjV1y0mvLeUlY1z0ojG9sg0AoQK00E1LVE04q4i2wnBVTdHj-W6IycmoXQK908H7_I5ktSh53Wbo6QzpIcQ4gJXHwR3U8CspkacEJZWXBKs_MMBktw</recordid><startdate>1972</startdate><enddate>1972</enddate><creator>Ord, J. 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L</creatorcontrib><creatorcontrib>Hopper, M. A.</creatorcontrib><creatorcontrib>Wang, W. P.</creatorcontrib><creatorcontrib>Univ. of Waterloo, Ont</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ord, J. L</au><au>Hopper, M. A.</au><au>Wang, W. P.</au><aucorp>Univ. of Waterloo, Ont</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Field-Dependence of the Dielectric Constant during the Anodic Oxidation of Tantalum, Niobium, and Tungsten</atitle><jtitle>J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972)</jtitle><date>1972</date><risdate>1972</risdate><volume>119</volume><issue>4</issue><spage>439</spage><pages>439-</pages><issn>0013-4651</issn><doi>10.1149/1.2404226</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972), 1972, Vol.119 (4), p.439 |
| issn | 0013-4651 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_2404226 |
| source | IOP Publishing Journals |
| subjects | ANODIZATION DIELECTRIC PROPERTIES ELECTRIC FIELDS MEASURING METHODS N50210 -Metals, Ceramics, & Other Materials-Metals & Alloys-Corrosion & Erosion & Surface Phenomena NIOBIUM NIOBIUM/oxide film formation on, field-dependence of dielectric constant during anodic OXIDATION REFRACTION TANTALUM TANTALUM/oxide film formation on, field- dependence of dielectric constant during anodic TUNGSTEN TUNGSTEN/oxide film formation on, field-dependence of dielectric constant during anodic |
| title | The Field-Dependence of the Dielectric Constant during the Anodic Oxidation of Tantalum, Niobium, and Tungsten |
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