The Field-Dependence of the Dielectric Constant during the Anodic Oxidation of Tantalum, Niobium, and Tungsten

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Bibliographische Detailangaben
Veröffentlicht in:	J. Electrochem. Soc. 119: No. 4, 439-45(Apr 1972) 439-45(Apr 1972), 1972, Vol.119 (4), p.439
Hauptverfasser:	Ord, J. L, Hopper, M. A., Wang, W. P.
Format:	Artikel
Sprache:	eng
Schlagworte:	ANODIZATION DIELECTRIC PROPERTIES ELECTRIC FIELDS MEASURING METHODS N50210 -Metals, Ceramics, & Other Materials-Metals & Alloys-Corrosion & Erosion & Surface Phenomena NIOBIUM NIOBIUM/oxide film formation on, field-dependence of dielectric constant during anodic OXIDATION REFRACTION TANTALUM TANTALUM/oxide film formation on, field- dependence of dielectric constant during anodic TUNGSTEN TUNGSTEN/oxide film formation on, field-dependence of dielectric constant during anodic
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