ALD: Emerging Materials, Processes, and Nanoscale Technology Applications

Nanoscale (zero-thickness) thin film growth processes such as atomic layer deposition are under extensive development for potential use in key nanoelectronics applications. The unique characteristics of these processes make them potentially enabling for a number of emerging nanotechnology-driven tec...

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Veröffentlicht in:ECS transactions 2006-07, Vol.1 (10), p.29-36
Hauptverfasser: Eisenbraun, Eric, Carpenter, Michael, Siddique, Rezina, Naczas, Sebastian, Zeng, Wanxue, Luo, Fu, Kaloyeros, Alain
Format: Artikel
Sprache:eng
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Zusammenfassung:Nanoscale (zero-thickness) thin film growth processes such as atomic layer deposition are under extensive development for potential use in key nanoelectronics applications. The unique characteristics of these processes make them potentially enabling for a number of emerging nanotechnology-driven technologies. This paper discusses several of these potential applications and highlights specific fields where ALD is being researched.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.2209327