Characteristics of Amorphous Bi[sub 2]Ti[sub 2]O[sub 7] Thin Films Grown by Atomic Layer Deposition for Memory Capacitor Applications
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| Veröffentlicht in: | Journal of the Electrochemical Society 2006, Vol.153 (1), p.F20 |
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| container_issue | 1 |
| container_start_page | F20 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 153 |
| creator | Hwang, Gyu Weon Kim, Wan Don Min, Yo-Sep Cho, Young Jin Hwang, Cheol Seong |
| description | |
| doi_str_mv | 10.1149/1.2133713 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 2006, Vol.153 (1), p.F20 |
| issn | 0013-4651 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_2133713 |
| source | Institute of Physics Journals |
| title | Characteristics of Amorphous Bi[sub 2]Ti[sub 2]O[sub 7] Thin Films Grown by Atomic Layer Deposition for Memory Capacitor Applications |
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