Deposition of Plasma Silicon Oxide Thin Films in a Production Planar Reactor
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| Veröffentlicht in: | Journal of the Electrochemical Society 1979-06, Vol.126 (6), p.930-934 |
|---|---|
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| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| container_end_page | 934 |
|---|---|
| container_issue | 6 |
| container_start_page | 930 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 126 |
| creator | Hollahan, John R. |
| description | |
| doi_str_mv | 10.1149/1.2129196 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1979-06, Vol.126 (6), p.930-934 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_2129196 |
| source | IOP Publishing Journals |
| title | Deposition of Plasma Silicon Oxide Thin Films in a Production Planar Reactor |
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