Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of the Electrochemical Society 2006, Vol.153 (1), p.F1
Hauptverfasser:	Luo, Qian, Dragomir-Cernatescu, Iuliana, Snyder, Robert L., Rees, Will S., Hess, Dennis W.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue	1
container_start_page	F1
container_title	Journal of the Electrochemical Society
container_volume	153
creator	Luo, Qian Dragomir-Cernatescu, Iuliana Snyder, Robert L. Rees, Will S. Hess, Dennis W.
description
doi_str_mv	10.1149/1.2128119
format	Article
fullrecord	<record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_2128119</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1149_1_2128119</sourcerecordid><originalsourceid>FETCH-LOGICAL-c1099-9a168b25123b5d70b6c3360fc28a1bac8244358396a3cdb840ed07147a7a19e73</originalsourceid><addsrcrecordid>eNo9kLtOwzAYRj2ARCkMvIFXhhT_tpPYI0oprRQ1C7AgFPkWyVFzwU6Hvj1BREyfjj7pDAehByAbAC6fYEOBCgB5hVaEAEt4lsINuo2xnREEz1eoLYZuVMHHocdDg49-Ct46i_dN9RnPGtMvvPOnLuKtG4fop_nyPf7_VG_xcYEK6wve-uDMhEv_ffYWH_p2Jj-7i4_tHbpu1Cm6-2XX6H338lbsk7J6PRTPZWKASJlIBZnQNAXKdGpzojPDWEYaQ4UCrYygnLNUMJkpZqwWnDhLcuC5yhVIl7M1evzzmjDEGFxTj8F3KlxqIPVvmBrqJQz7ATSlVNk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD</title><source>Institute of Physics Journals</source><creator>Luo, Qian ; Dragomir-Cernatescu, Iuliana ; Snyder, Robert L. ; Rees, Will S. ; Hess, Dennis W.</creator><creatorcontrib>Luo, Qian ; Dragomir-Cernatescu, Iuliana ; Snyder, Robert L. ; Rees, Will S. ; Hess, Dennis W.</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>DOI: 10.1149/1.2128119</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 2006, Vol.153 (1), p.F1</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c1099-9a168b25123b5d70b6c3360fc28a1bac8244358396a3cdb840ed07147a7a19e73</citedby><cites>FETCH-LOGICAL-c1099-9a168b25123b5d70b6c3360fc28a1bac8244358396a3cdb840ed07147a7a19e73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4010,27900,27901,27902</link.rule.ids></links><search><creatorcontrib>Luo, Qian</creatorcontrib><creatorcontrib>Dragomir-Cernatescu, Iuliana</creatorcontrib><creatorcontrib>Snyder, Robert L.</creatorcontrib><creatorcontrib>Rees, Will S.</creatorcontrib><creatorcontrib>Hess, Dennis W.</creatorcontrib><title>Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD</title><title>Journal of the Electrochemical Society</title><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNo9kLtOwzAYRj2ARCkMvIFXhhT_tpPYI0oprRQ1C7AgFPkWyVFzwU6Hvj1BREyfjj7pDAehByAbAC6fYEOBCgB5hVaEAEt4lsINuo2xnREEz1eoLYZuVMHHocdDg49-Ct46i_dN9RnPGtMvvPOnLuKtG4fop_nyPf7_VG_xcYEK6wve-uDMhEv_ffYWH_p2Jj-7i4_tHbpu1Cm6-2XX6H338lbsk7J6PRTPZWKASJlIBZnQNAXKdGpzojPDWEYaQ4UCrYygnLNUMJkpZqwWnDhLcuC5yhVIl7M1evzzmjDEGFxTj8F3KlxqIPVvmBrqJQz7ATSlVNk</recordid><startdate>2006</startdate><enddate>2006</enddate><creator>Luo, Qian</creator><creator>Dragomir-Cernatescu, Iuliana</creator><creator>Snyder, Robert L.</creator><creator>Rees, Will S.</creator><creator>Hess, Dennis W.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2006</creationdate><title>Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD</title><author>Luo, Qian ; Dragomir-Cernatescu, Iuliana ; Snyder, Robert L. ; Rees, Will S. ; Hess, Dennis W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1099-9a168b25123b5d70b6c3360fc28a1bac8244358396a3cdb840ed07147a7a19e73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Luo, Qian</creatorcontrib><creatorcontrib>Dragomir-Cernatescu, Iuliana</creatorcontrib><creatorcontrib>Snyder, Robert L.</creatorcontrib><creatorcontrib>Rees, Will S.</creatorcontrib><creatorcontrib>Hess, Dennis W.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Luo, Qian</au><au>Dragomir-Cernatescu, Iuliana</au><au>Snyder, Robert L.</au><au>Rees, Will S.</au><au>Hess, Dennis W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2006</date><risdate>2006</risdate><volume>153</volume><issue>1</issue><spage>F1</spage><pages>F1-</pages><issn>0013-4651</issn><doi>10.1149/1.2128119</doi><oa>free_for_read</oa></addata></record>
fulltext	fulltext
identifier	ISSN: 0013-4651
ispartof	Journal of the Electrochemical Society, 2006, Vol.153 (1), p.F1
issn	0013-4651
language	eng
recordid	cdi_crossref_primary_10_1149_1_2128119
source	Institute of Physics Journals
title	Comparison of Nitrided HfO[sub 2] Films Deposited in O[sub 2] and N[sub 2]O by Direct Liquid Injection CVD
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T17%3A52%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Comparison%20of%20Nitrided%20HfO%5Bsub%202%5D%20Films%20Deposited%20in%20O%5Bsub%202%5D%20and%20N%5Bsub%202%5DO%20by%20Direct%20Liquid%20Injection%20CVD&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Luo,%20Qian&rft.date=2006&rft.volume=153&rft.issue=1&rft.spage=F1&rft.pages=F1-&rft.issn=0013-4651&rft_id=info:doi/10.1149/1.2128119&rft_dat=%3Ccrossref%3E10_1149_1_2128119%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true