Plasma Etching of Silicon and Silicon Dioxide with Hydrogen Fluoride Mixtures
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| Veröffentlicht in: | Journal of the Electrochemical Society 1982-01, Vol.129 (8), p.1770-1772 |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 1772 |
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| container_issue | 8 |
| container_start_page | 1770 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 129 |
| creator | Smolinsky, G. Mayer, T. M. Truesdale, E. A. |
| description | |
| doi_str_mv | 10.1149/1.2124290 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1982-01, Vol.129 (8), p.1770-1772 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_2124290 |
| source | IOP Publishing Journals |
| title | Plasma Etching of Silicon and Silicon Dioxide with Hydrogen Fluoride Mixtures |
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