Growth and Physical Properties of LPCVD Polycrystalline SiO x Films
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| Veröffentlicht in: | Journal of the Electrochemical Society 1986-09, Vol.133 (9), p.1880-1886 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng ; jpn |
| Online-Zugang: | Volltext |
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| container_end_page | 1886 |
|---|---|
| container_issue | 9 |
| container_start_page | 1880 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 133 |
| creator | Widmer, A. E. Harbeke, G. Krausbauer, L. Steigmeier, E. F. |
| description | |
| doi_str_mv | 10.1149/1.2109041 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1986-09, Vol.133 (9), p.1880-1886 |
| issn | 0013-4651 1945-7111 |
| language | eng ; jpn |
| recordid | cdi_crossref_primary_10_1149_1_2109041 |
| source | IOP Publishing Journals |
| title | Growth and Physical Properties of LPCVD Polycrystalline SiO x Films |
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