Silicon cantilever beams fabricated by electrochemically controlled etching for sensor applications

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Veröffentlicht in:	Journal of the Electrochemical Society 1986-08, Vol.133 (8), p.1724-1729
Hauptverfasser:	SARRO, P. M, VAN HERWAARDEN, A. W
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Other techniques and industries Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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doi_str_mv	10.1149/1.2109003
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source	IOP Publishing Journals
subjects	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Other techniques and industries Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title	Silicon cantilever beams fabricated by electrochemically controlled etching for sensor applications
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