Curcumin as a positive resist dye optimized for g- and h-line exposure

It has now been firmly established, both theoretically and experimentally, that the addition of a non-bleachable absorber (or dye) to photoresist can reduce notching and other linewidth control variations associated with the patterning of reflective surfaces. Such variations are due to two separate, but closely related, effects. The first of these effects is reflection of light off scattering centers on the substrate at angles other than surface-normal.