Analysis of Nonuniformities in the Plasma Etching of Silicon with CF 4 / O 2
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| Veröffentlicht in: | Journal of the Electrochemical Society 1990-03, Vol.137 (3), p.954-960 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 960 |
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| container_issue | 3 |
| container_start_page | 954 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 137 |
| creator | Kao, Alan S. Stenger, Harvey G. |
| description | |
| doi_str_mv | 10.1149/1.2086586 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1990-03, Vol.137 (3), p.954-960 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_2086586 |
| source | IOP Publishing Journals |
| title | Analysis of Nonuniformities in the Plasma Etching of Silicon with CF 4 / O 2 |
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