Calculation of gas spectra for quantitative Fourier transform infrared spectroscopy of chemical vapor deposition

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Veröffentlicht in:	Journal of the Electrochemical Society 1998-09, Vol.145 (9), p.3212-3219
Hauptverfasser:	MORRISON, P. W, TAWEECHOKESUPSIN, O
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of crystal growth physics of crystal growth Methods of deposition of films and coatings film growth and epitaxy Physics Theory and models of crystal growth physics of crystal growth, crystal morphology and orientation
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