Gravitational stress-induced dislocations in large-diameter silicon wafers studied by X-ray topography and computer simulation
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Veröffentlicht in: | Journal of the Electrochemical Society 1998-07, Vol.145 (7), p.2523-2529 |
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container_issue | 7 |
container_start_page | 2523 |
container_title | Journal of the Electrochemical Society |
container_volume | 145 |
creator | SHIMIZU, H ISOMAE, S MINOWA, K SATOH, T SUZUKI, T |
description | |
doi_str_mv | 10.1149/1.1838672 |
format | Article |
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ispartof | Journal of the Electrochemical Society, 1998-07, Vol.145 (7), p.2523-2529 |
issn | 0013-4651 1945-7111 |
language | eng |
recordid | cdi_crossref_primary_10_1149_1_1838672 |
source | IOP Publishing Journals |
subjects | Condensed matter: structure, mechanical and thermal properties Defects and impurities in crystals microstructure Exact sciences and technology Linear defects: dislocations, disclinations Physics Structure of solids and liquids crystallography |
title | Gravitational stress-induced dislocations in large-diameter silicon wafers studied by X-ray topography and computer simulation |
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