The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium
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| Veröffentlicht in: | Journal of the Electrochemical Society 1998-02, Vol.145 (2), p.676-683 |
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| container_end_page | 683 |
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| container_issue | 2 |
| container_start_page | 676 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 145 |
| creator | FALTERMEIER, C. G GOLDBERG, C JONES, M UPHAM, A KNORR, A IVANOVA, A PETERSON, G KALOYEROS, A. E ARKLES, B |
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| doi_str_mv | 10.1149/1.1838322 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1998-02, Vol.145 (2), p.676-683 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_1838322 |
| source | IOP Publishing Journals |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium |
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