Modeling of plasma etch systems using ordinary least squares, recurrent neural network, and projection to latent structure models
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| Veröffentlicht in: | Journal of the Electrochemical Society 1997-04, Vol.144 (4), p.1379-1389 |
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| container_end_page | 1389 |
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| container_issue | 4 |
| container_start_page | 1379 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 144 |
| creator | BUSHMAN, S EDGAR, T. F TRACHTENBERG, I |
| description | |
| doi_str_mv | 10.1149/1.1837600 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1997-04, Vol.144 (4), p.1379-1389 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_1837600 |
| source | IOP Publishing Journals |
| subjects | Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | Modeling of plasma etch systems using ordinary least squares, recurrent neural network, and projection to latent structure models |
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