The prevention of Si pitting in hydrofluoric acid cleaning by additions of hydrochloric acid

The prevention of Si pitting in hydrofluoric acid cleaning by additions of hydrochloric acid

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Veröffentlicht in:Journal of the Electrochemical Society 1997-02, Vol.144 (2), p.652-657
Hauptverfasser: CHUNG, B. C, MARSHALL, G. A, PEARCE, C. W, YANDERS, K. R
Format: Artikel
Sprache:eng
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Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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container_title Journal of the Electrochemical Society
container_volume 144
creator CHUNG, B. C
MARSHALL, G. A
PEARCE, C. W
YANDERS, K. R
description
doi_str_mv 10.1149/1.1837462
format Article
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subjects Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title The prevention of Si pitting in hydrofluoric acid cleaning by additions of hydrochloric acid
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