Investigation of island formation during through-mask electrochemical micromachining

Investigation of island formation during through-mask electrochemical micromachining

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Veröffentlicht in:Journal of the Electrochemical Society 1996-07, Vol.143 (7), p.2305-2309
Hauptverfasser: SHENOY, R. V, DATTA, M, ROMANKIW, L. T
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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container_end_page 2309
container_issue 7
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container_title Journal of the Electrochemical Society
container_volume 143
creator SHENOY, R. V
DATTA, M
ROMANKIW, L. T
description
doi_str_mv 10.1149/1.1836997
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ispartof Journal of the Electrochemical Society, 1996-07, Vol.143 (7), p.2305-2309
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1945-7111
language eng
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source IOP Publishing Journals
subjects Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Investigation of island formation during through-mask electrochemical micromachining
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