High quality fluorinated silicon dioxide films prepared by temperature-difference-based liquid-phase deposition with ammonium hydroxide incorporation

Bibliographische Detailangaben

Veröffentlicht in:	Journal of the Electrochemical Society 2003-03, Vol.150 (3), p.F29-F32
Hauptverfasser:	LEE, Ming-Kwei, SHIEH, Wu-Hung, SHIH, Chung-Min, LIN, Shuo-Yen, TUNG, Kuan-Wen
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Liquid phase epitaxy deposition from liquid phases (melts, solutions, and surface layers on liquids) Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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