Excimer laser annealing effect on nickel-induced crystallized polycrystalline silicon film

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Veröffentlicht in:	Journal of the Electrochemical Society 2001-10, Vol.148 (10), p.G563-G565
Hauptverfasser:	PARK, Kee-Chan, SONG, In-Hyuk, JEON, Jae-Hong, HAN, Min-Koo
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Surface treatments
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doi_str_mv	10.1149/1.1398279
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source	IOP Publishing Journals
subjects	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Surface treatments
title	Excimer laser annealing effect on nickel-induced crystallized polycrystalline silicon film
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