In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing
Gespeichert in:
| Veröffentlicht in: | Journal of the Electrochemical Society 2000-07, Vol.147 (7), p.2741-2743 |
|---|---|
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 2743 |
|---|---|
| container_issue | 7 |
| container_start_page | 2741 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 147 |
| creator | BULLEN, D SCARFO, A KOCH, A BRAMONO, D. P. Y COPPETA, J RACZ, L |
| description | |
| doi_str_mv | 10.1149/1.1393598 |
| format | Article |
| fullrecord | <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_1393598</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1443462</sourcerecordid><originalsourceid>FETCH-LOGICAL-c256t-c33a6ee439ad10f5e1338928e5b0aa4393bda7eeb6dff8abc8b761f83b1a4fa53</originalsourceid><addsrcrecordid>eNpFkE9PwzAMxSMEEmNw4BvkwIVDR70kbXpEE38mTeIC58pJHRrUdiVpD_v2ZDCJ07P9frasx9gt5CsAWT3ACkQlVKXP2AIqqbISAM7ZIs9BZLJQcMmuYvxKLWhZLpjZDjz6aeYT2Xbw3zNxtw-8OQzYe8tdN_uGO9_1fAwU4xyI94RH7WmYeDMHP3xy21KisUuebXH4Lcd952Ob3Gt24bCLdHPSJft4fnrfvGa7t5ft5nGX2bUqpswKgQWRFBU2kDtFIISu1pqUyRHTWJgGSyJTNM5pNFabsgCnhQGUDpVYsvu_uzbsYwzk6jH4HsOhhrw-hlNDfQonsXd_7IgxPesCDtbH_wUphSzW4gcwcmYF</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing</title><source>IOP Publishing Journals</source><creator>BULLEN, D ; SCARFO, A ; KOCH, A ; BRAMONO, D. P. Y ; COPPETA, J ; RACZ, L</creator><creatorcontrib>BULLEN, D ; SCARFO, A ; KOCH, A ; BRAMONO, D. P. Y ; COPPETA, J ; RACZ, L</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/1.1393598</identifier><identifier>CODEN: JESOAN</identifier><language>eng</language><publisher>Pennington, NJ: Electrochemical Society</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Fluid dynamics ; Fundamental areas of phenomenology (including applications) ; Instrumentation for fluid dynamics ; Mechanical engineering. Machine design ; Microelectronic fabrication (materials and surfaces technology) ; Physics ; Precision engineering, watch making ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>Journal of the Electrochemical Society, 2000-07, Vol.147 (7), p.2741-2743</ispartof><rights>2000 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c256t-c33a6ee439ad10f5e1338928e5b0aa4393bda7eeb6dff8abc8b761f83b1a4fa53</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1443462$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>BULLEN, D</creatorcontrib><creatorcontrib>SCARFO, A</creatorcontrib><creatorcontrib>KOCH, A</creatorcontrib><creatorcontrib>BRAMONO, D. P. Y</creatorcontrib><creatorcontrib>COPPETA, J</creatorcontrib><creatorcontrib>RACZ, L</creatorcontrib><title>In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing</title><title>Journal of the Electrochemical Society</title><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Fluid dynamics</subject><subject>Fundamental areas of phenomenology (including applications)</subject><subject>Instrumentation for fluid dynamics</subject><subject>Mechanical engineering. Machine design</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Physics</subject><subject>Precision engineering, watch making</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNpFkE9PwzAMxSMEEmNw4BvkwIVDR70kbXpEE38mTeIC58pJHRrUdiVpD_v2ZDCJ07P9frasx9gt5CsAWT3ACkQlVKXP2AIqqbISAM7ZIs9BZLJQcMmuYvxKLWhZLpjZDjz6aeYT2Xbw3zNxtw-8OQzYe8tdN_uGO9_1fAwU4xyI94RH7WmYeDMHP3xy21KisUuebXH4Lcd952Ob3Gt24bCLdHPSJft4fnrfvGa7t5ft5nGX2bUqpswKgQWRFBU2kDtFIISu1pqUyRHTWJgGSyJTNM5pNFabsgCnhQGUDpVYsvu_uzbsYwzk6jH4HsOhhrw-hlNDfQonsXd_7IgxPesCDtbH_wUphSzW4gcwcmYF</recordid><startdate>20000701</startdate><enddate>20000701</enddate><creator>BULLEN, D</creator><creator>SCARFO, A</creator><creator>KOCH, A</creator><creator>BRAMONO, D. P. Y</creator><creator>COPPETA, J</creator><creator>RACZ, L</creator><general>Electrochemical Society</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20000701</creationdate><title>In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing</title><author>BULLEN, D ; SCARFO, A ; KOCH, A ; BRAMONO, D. P. Y ; COPPETA, J ; RACZ, L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c256t-c33a6ee439ad10f5e1338928e5b0aa4393bda7eeb6dff8abc8b761f83b1a4fa53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Fluid dynamics</topic><topic>Fundamental areas of phenomenology (including applications)</topic><topic>Instrumentation for fluid dynamics</topic><topic>Mechanical engineering. Machine design</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Physics</topic><topic>Precision engineering, watch making</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BULLEN, D</creatorcontrib><creatorcontrib>SCARFO, A</creatorcontrib><creatorcontrib>KOCH, A</creatorcontrib><creatorcontrib>BRAMONO, D. P. Y</creatorcontrib><creatorcontrib>COPPETA, J</creatorcontrib><creatorcontrib>RACZ, L</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BULLEN, D</au><au>SCARFO, A</au><au>KOCH, A</au><au>BRAMONO, D. P. Y</au><au>COPPETA, J</au><au>RACZ, L</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2000-07-01</date><risdate>2000</risdate><volume>147</volume><issue>7</issue><spage>2741</spage><epage>2743</epage><pages>2741-2743</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><coden>JESOAN</coden><cop>Pennington, NJ</cop><pub>Electrochemical Society</pub><doi>10.1149/1.1393598</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 2000-07, Vol.147 (7), p.2741-2743 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_1393598 |
| source | IOP Publishing Journals |
| subjects | Applied sciences Electronics Exact sciences and technology Fluid dynamics Fundamental areas of phenomenology (including applications) Instrumentation for fluid dynamics Mechanical engineering. Machine design Microelectronic fabrication (materials and surfaces technology) Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T10%3A39%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=In%20situ%20technique%20for%20dynamic%20fluid%20film%20pressure%20measurement%20during%20chemical%20mechanical%20polishing&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=BULLEN,%20D&rft.date=2000-07-01&rft.volume=147&rft.issue=7&rft.spage=2741&rft.epage=2743&rft.pages=2741-2743&rft.issn=0013-4651&rft.eissn=1945-7111&rft.coden=JESOAN&rft_id=info:doi/10.1149/1.1393598&rft_dat=%3Cpascalfrancis_cross%3E1443462%3C/pascalfrancis_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |