In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of the Electrochemical Society 2000-07, Vol.147 (7), p.2741-2743
Hauptverfasser:	BULLEN, D, SCARFO, A, KOCH, A, BRAMONO, D. P. Y, COPPETA, J, RACZ, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Fluid dynamics Fundamental areas of phenomenology (including applications) Instrumentation for fluid dynamics Mechanical engineering. Machine design Microelectronic fabrication (materials and surfaces technology) Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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