Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures
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Veröffentlicht in: | Journal of the Electrochemical Society 2001, Vol.148 (1), p.E52 |
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container_issue | 1 |
container_start_page | E52 |
container_title | Journal of the Electrochemical Society |
container_volume | 148 |
creator | Nishikiori, Tokujiro Nohira, Toshiyuki Ito, Yasuhiko |
description | |
doi_str_mv | 10.1149/1.1344551 |
format | Article |
fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_1344551</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1149_1_1344551</sourcerecordid><originalsourceid>FETCH-LOGICAL-c1751-5c6e3013550470545170ee48e8c02032128c19b03f794924e948875fed278c133</originalsourceid><addsrcrecordid>eNotULFOwzAU9AASpWXgD7wypPjFdp2MKFASqSpLmCPXeSlGiRPZZsjfk6qdTnenO52OkGdgWwCRv8IWuBBSwh1ZMQY8ETsJD-QxhN-FQibUinTl3PrxjI5Ww4R-QH2yvY0zHTta2yPd234IVLuWVjHQd5zQtegM0tHRo43XaDEuioteR7vIOtLSnn9ojZdGHf88hg2573Qf8OmGa_K9_6iLMjl8fVbF2yExoCQk0uyQL0ulZEIxKSQohigyzAxLGU8hzQzkJ8Y7lYs8FZiLLFOywzZVi8P5mrxce40fQ_DYNZO3g_ZzA6y5nNJAczuF_wMAtVSh</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures</title><source>IOP Publishing Journals</source><creator>Nishikiori, Tokujiro ; Nohira, Toshiyuki ; Ito, Yasuhiko</creator><creatorcontrib>Nishikiori, Tokujiro ; Nohira, Toshiyuki ; Ito, Yasuhiko</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>DOI: 10.1149/1.1344551</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 2001, Vol.148 (1), p.E52</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c1751-5c6e3013550470545170ee48e8c02032128c19b03f794924e948875fed278c133</citedby><cites>FETCH-LOGICAL-c1751-5c6e3013550470545170ee48e8c02032128c19b03f794924e948875fed278c133</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4009,27902,27903,27904</link.rule.ids></links><search><creatorcontrib>Nishikiori, Tokujiro</creatorcontrib><creatorcontrib>Nohira, Toshiyuki</creatorcontrib><creatorcontrib>Ito, Yasuhiko</creatorcontrib><title>Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures</title><title>Journal of the Electrochemical Society</title><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNotULFOwzAU9AASpWXgD7wypPjFdp2MKFASqSpLmCPXeSlGiRPZZsjfk6qdTnenO52OkGdgWwCRv8IWuBBSwh1ZMQY8ETsJD-QxhN-FQibUinTl3PrxjI5Ww4R-QH2yvY0zHTta2yPd234IVLuWVjHQd5zQtegM0tHRo43XaDEuioteR7vIOtLSnn9ojZdGHf88hg2573Qf8OmGa_K9_6iLMjl8fVbF2yExoCQk0uyQL0ulZEIxKSQohigyzAxLGU8hzQzkJ8Y7lYs8FZiLLFOywzZVi8P5mrxce40fQ_DYNZO3g_ZzA6y5nNJAczuF_wMAtVSh</recordid><startdate>2001</startdate><enddate>2001</enddate><creator>Nishikiori, Tokujiro</creator><creator>Nohira, Toshiyuki</creator><creator>Ito, Yasuhiko</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2001</creationdate><title>Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures</title><author>Nishikiori, Tokujiro ; Nohira, Toshiyuki ; Ito, Yasuhiko</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1751-5c6e3013550470545170ee48e8c02032128c19b03f794924e948875fed278c133</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nishikiori, Tokujiro</creatorcontrib><creatorcontrib>Nohira, Toshiyuki</creatorcontrib><creatorcontrib>Ito, Yasuhiko</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nishikiori, Tokujiro</au><au>Nohira, Toshiyuki</au><au>Ito, Yasuhiko</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2001</date><risdate>2001</risdate><volume>148</volume><issue>1</issue><spage>E52</spage><pages>E52-</pages><issn>0013-4651</issn><doi>10.1149/1.1344551</doi><oa>free_for_read</oa></addata></record> |
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language | eng |
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source | IOP Publishing Journals |
title | Hydrogen Impermeability of TiN Films and Its Dependence on Nitrogen Concentration at High Temperatures |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T11%3A08%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Hydrogen%20Impermeability%20of%20TiN%20Films%20and%20Its%20Dependence%20on%20Nitrogen%20Concentration%20at%20High%20Temperatures&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Nishikiori,%20Tokujiro&rft.date=2001&rft.volume=148&rft.issue=1&rft.spage=E52&rft.pages=E52-&rft.issn=0013-4651&rft_id=info:doi/10.1149/1.1344551&rft_dat=%3Ccrossref%3E10_1149_1_1344551%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |