Influence of Potential and the Presence of Boric Acid on Pt 1-x Co x Alloy Electrodeposition and Magnetic Properties
The effects of potential and the presence of B(OH) 3 on Pt 1-x Co x alloy electrodeposition from aqueous chloride-based solutions on Ru substrates was investigated. Films deposited at potentials more reducing than −0.65 V vs SCE were hexagonal close packed and greater than 90% Co (mole basis), and f...
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Veröffentlicht in: | Journal of the Electrochemical Society 2024-08, Vol.171 (8), p.82503 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The effects of potential and the presence of B(OH)
3
on Pt
1-x
Co
x
alloy electrodeposition from aqueous chloride-based solutions on Ru substrates was investigated. Films deposited at potentials more reducing than −0.65 V vs SCE were hexagonal close packed and greater than 90% Co (mole basis), and films deposited at potentials more oxidizing than −0.65 V were face centered cubic and showed a monotonic decrease in cobalt content as the potential increased. The composition and structure-potential dependences were not strongly affected by the presence of B(OH)
3
. Structural change coincided with a distinct knee-like feature in the composition-potential relationship, along with a prominent narrow voltammetric peak associated with Co deposition, possibly related to nucleation and growth of the hcp phase. The presence of B(OH)
3
produced a sharp minimum in both Coulombic efficiency and deposition rate at potentials near −0.65 V and almost entirely suppressed the voltammetric feature. This may be associated with a combination of B(OH)
3
-derived proton reduction and inhibition of metal deposition by adsorbed B(OH)
3
or B(OH)
3
-derived species. The presence of B(OH)
3
affected the magnetic behavior of films deposited at potentials more oxidizing than −0.55 V (i.e., those with compositions less than about 40% Co) only weakly, but resulted in generally smaller maximum magnetizations for films deposited at more reducing potentials, and notably a much lower magnetization for films deposited at −0.65 V. |
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ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/1945-7111/ad6b48 |