Influence of Potential and the Presence of Boric Acid on Pt 1-x Co x Alloy Electrodeposition and Magnetic Properties

The effects of potential and the presence of B(OH) 3 on Pt 1-x Co x alloy electrodeposition from aqueous chloride-based solutions on Ru substrates was investigated. Films deposited at potentials more reducing than −0.65 V vs SCE were hexagonal close packed and greater than 90% Co (mole basis), and f...

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Veröffentlicht in:Journal of the Electrochemical Society 2024-08, Vol.171 (8), p.82503
Hauptverfasser: Rus, Eric D., Corrêa, Eduardo L., Dennis, Cindi L., Moffat, Thomas P.
Format: Artikel
Sprache:eng
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Zusammenfassung:The effects of potential and the presence of B(OH) 3 on Pt 1-x Co x alloy electrodeposition from aqueous chloride-based solutions on Ru substrates was investigated. Films deposited at potentials more reducing than −0.65 V vs SCE were hexagonal close packed and greater than 90% Co (mole basis), and films deposited at potentials more oxidizing than −0.65 V were face centered cubic and showed a monotonic decrease in cobalt content as the potential increased. The composition and structure-potential dependences were not strongly affected by the presence of B(OH) 3 . Structural change coincided with a distinct knee-like feature in the composition-potential relationship, along with a prominent narrow voltammetric peak associated with Co deposition, possibly related to nucleation and growth of the hcp phase. The presence of B(OH) 3 produced a sharp minimum in both Coulombic efficiency and deposition rate at potentials near −0.65 V and almost entirely suppressed the voltammetric feature. This may be associated with a combination of B(OH) 3 -derived proton reduction and inhibition of metal deposition by adsorbed B(OH) 3 or B(OH) 3 -derived species. The presence of B(OH) 3 affected the magnetic behavior of films deposited at potentials more oxidizing than −0.55 V (i.e., those with compositions less than about 40% Co) only weakly, but resulted in generally smaller maximum magnetizations for films deposited at more reducing potentials, and notably a much lower magnetization for films deposited at −0.65 V.
ISSN:0013-4651
1945-7111
DOI:10.1149/1945-7111/ad6b48