Direct Deposition of Dense YSZ/Ni-YSZ Thin-Film Bilayers on Porous Anode-Supported Cells with High Performance and Stability

We present an approach for integrating a thin-film bilayer combination comprising a Ni(O)-YSZ nanocomposite layer and a YSZ thin-film electrolyte prepared using pulsed laser deposition into the architecture of porous Ni-YSZ-supported cells. Achieving a minimum bilayer thickness threshold of ~1.5 µm...

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Veröffentlicht in:ECS transactions 2023-05, Vol.111 (6), p.1501-1508
Hauptverfasser: Bagarinao, Katherine Develos, Yamaguchi, Toshiaki, Kishimoto, Haruo
Format: Artikel
Sprache:eng
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Zusammenfassung:We present an approach for integrating a thin-film bilayer combination comprising a Ni(O)-YSZ nanocomposite layer and a YSZ thin-film electrolyte prepared using pulsed laser deposition into the architecture of porous Ni-YSZ-supported cells. Achieving a minimum bilayer thickness threshold of ~1.5 µm is found to be critical to achieve a high open circuit voltage value, as well as a significant decrease in the ohmic resistance to ~0.06 Ωcm 2 at 750 °C and increase in maximum power density to 1.83 W/cm 2 . Short-term durability tests up to 45 h at a constant potential of 0.8 V showed stable operation with current densities reaching ~1.7 A/cm 2 . Cells utilizing thin-film bilayers can overcome issues associated degradation in conventionally sintered cells, in terms of maintaining excellent contact with the anode support and significantly suppressing Ni diffusion into the YSZ electrolyte.
ISSN:1938-5862
1938-6737
DOI:10.1149/11106.1501ecst