The Optimization of Thermal Flow Field in a Large-Size MOCVD Reactor

In this paper, the effects of operating conditions in a large-size, vertical and close-spaced reactor for metalorganic chemical vapor deposition are investigated and described by simulation and analysis. The parameters are involved such as space between gas inlet and susceptor (11-20 mm), reactor wa...

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Veröffentlicht in:ECS transactions 2013-01, Vol.52 (1), p.1021-1026
Hauptverfasser: Hu, Chih-Kai, Li, Tomi T, Lin, Yi-Jiun
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description In this paper, the effects of operating conditions in a large-size, vertical and close-spaced reactor for metalorganic chemical vapor deposition are investigated and described by simulation and analysis. The parameters are involved such as space between gas inlet and susceptor (11-20 mm), reactor wall temperature (50-200℃), gas inlet temperature (50-200℃),and chamber pressure (100-760 torr). These listed parameters show that an optimization ideal stagnation flow can be achieved in a large-size close-spaced reactor.
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title The Optimization of Thermal Flow Field in a Large-Size MOCVD Reactor
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