The Optimization of Thermal Flow Field in a Large-Size MOCVD Reactor

In this paper, the effects of operating conditions in a large-size, vertical and close-spaced reactor for metalorganic chemical vapor deposition are investigated and described by simulation and analysis. The parameters are involved such as space between gas inlet and susceptor (11-20 mm), reactor wall temperature (50-200℃), gas inlet temperature (50-200℃),and chamber pressure (100-760 torr). These listed parameters show that an optimization ideal stagnation flow can be achieved in a large-size close-spaced reactor.