Mechanism of Perfluorsulfonic Acid Membrane Chemical Degradation Under Low RH Conditions

Mechanism of Perfluorsulfonic Acid Membrane Chemical Degradation Under Low RH Conditions

A highly versatile and robust hydrogen peroxide vapor test has been employed to probe the chemical degradation of NRE212CS and N112 membranes under a wide variety of RH environments. Under very low RH conditions, sulfonic acid pKa value increases and chain scission processes become operative leading...

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Veröffentlicht in:ECS transactions 2013-03, Vol.50 (2), p.907-918
Hauptverfasser: Coms, Frank D., Xu, Hui, McCallum, Tom, Mittelsteadt, Cortney
Format: Artikel
Sprache:eng
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Zusammenfassung:A highly versatile and robust hydrogen peroxide vapor test has been employed to probe the chemical degradation of NRE212CS and N112 membranes under a wide variety of RH environments. Under very low RH conditions, sulfonic acid pKa value increases and chain scission processes become operative leading to an increase in the carboxylic acid content and subsequent decreased high humidity chemical stability of the membranes.
ISSN:1938-5862
1938-6737
DOI:10.1149/05002.0907ecst