Film Thickness Dependence of Ferroelectric Properties of (111)-Oriented Epitaxial Bi(Mg 1/2 Ti 1/2 )O 3 Films
The origin of the ferroelectricity of Bi(Mg 1/2 Ti 1/2 )O 3 films was investigated. Epitaxial Bi(Mg 1/2 Ti 1/2 )O 3 films with film thicknesses of 50 to 800 nm were grown on (111) c SrRuO 3 /(111)SrTiO 3 substrates by pulsed laser deposition. A Bi(Mg 1/2 Ti 1/2 )O 3 film was not strongly clamped fro...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2012-09, Vol.51 (9S1), p.9 |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The origin of the ferroelectricity of Bi(Mg
1/2
Ti
1/2
)O
3
films was investigated. Epitaxial Bi(Mg
1/2
Ti
1/2
)O
3
films with film thicknesses of 50 to 800 nm were grown on (111)
c
SrRuO
3
/(111)SrTiO
3
substrates by pulsed laser deposition. A Bi(Mg
1/2
Ti
1/2
)O
3
film was not strongly clamped from the substrate and identified to have rhombohedral symmetry with
a
= 0.398 nm and α= 89.8°, which was independent of film thickness within 100 to 800 nm. The relative dielectric constant, remanent polarization, and coercive field of the Bi(Mg
1/2
Ti
1/2
)O
3
films at room temperature were almost constant at about 250, 60 µC/cm
2
, and 240 kV/cm, respectively, for film thicknesses above 200 nm. These data suggest that Bi(Mg
1/2
Ti
1/2
)O
3
films are ferroelectric. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.51.09LA04 |