Bidirectional Two-Terminal Switching Device for Non-Volatile Random Access Memory
A two-terminal N + /P/N + Si junction device that can replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque magnetic random access memory (STT-MRAM), by three-dimensional device simulation. An N + /P/N + junction structure with $30\times 3...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2012-04, Vol.51 (4), p.04DJ02-04DJ02-4 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | A two-terminal N + /P/N + Si junction device that can replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque magnetic random access memory (STT-MRAM), by three-dimensional device simulation. An N + /P/N + junction structure with $30\times 30$ nm 2 area provides sufficient bidirectional current flow to write data by a drain-induced barrier lowering (DIBL) under a reverse bias at the N + /P (or P/N + ) junction, and high current on/off ratio of $10^{6}$, which is acceptable for STT-MRAM. In this work, critical parameters such as P-length, P doping, and N + doping are investigated to elucidate the optimal parameter condition in view of write current and current on/off ratio. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.51.04DJ02 |