Charge Modeling for Metal Layer on Insulating Substrate

A charging model for magnification variation in the observation of a metal pattern on an insulating substrate using a scanning electron microscope is proposed. To calculate the time evolution of charging, we replace electron trajectory with current. Negative charging of the metal layer is observed a...

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Veröffentlicht in:Japanese Journal of Applied Physics 2011-06, Vol.50 (6), p.06GC01-06GC01-6
Hauptverfasser: Okai, Nobuhiro, Yano, Tasuku, Sohda, Yasunari
Format: Artikel
Sprache:eng
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Zusammenfassung:A charging model for magnification variation in the observation of a metal pattern on an insulating substrate using a scanning electron microscope is proposed. To calculate the time evolution of charging, we replace electron trajectory with current. Negative charging of the metal layer is observed and is caused by the current from the anode, which is set above the sample, to the metal layer. The origin of the current is tertiary electrons produced by backscattered electrons colliding with the anode. By controlling tertiary-electron trajectories through the application of bias voltage to the anode, the magnification variation can be reduced to almost zero.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.50.06GC01