Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors
The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary ele...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2011-03, Vol.50 (3), p.031002-031002-6 |
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creator | Moser, Pascal Bläsing, Jürgen Dadgar, Armin Hempel, Thomas Christen, Jürgen Krost, Alois |
description | The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary electron microscope, Nomarski microscope and various X-ray diffraction techniques. Samples grown with AlInN layers obtaining a slightly lower and a higher indium concentration compared to the lattice matched samples show a strong degradation of the AlInN/GaN double layers. The degradation of the multilayer structures both on a microscopic and on a macroscopic scale is investigated, revealing a much stronger roughening of the AlInN surfaces with higher indium concentration. The roughening is attributed to a Stranski--Krastanov transition from two-dimensional to three-dimensional growth mode. |
doi_str_mv | 10.1143/JJAP.50.031002 |
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fullrecord | <record><control><sourceid>ipap_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_50_031002</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_50_031002</sourcerecordid><originalsourceid>FETCH-LOGICAL-c321t-30f49f4133cd4a9746a2e47084e019b514d175fe0e9c640ecd7fcec6c885b99f3</originalsourceid><addsrcrecordid>eNqFj81PhDAQxRujibh69czZBHaGToEecaPrbnA1fpxJt7QbDAJpSdT_XjZ49_TmvZk3yY-xa4QYkfhyuy2eYwExcARITliAnLKIIBWnLJgSjEgmyTm78P5jsqkgDFj2OjrjffhiWvWtxqbvwqYLy_4rmhZqGot20-2Wa7ULb506HMLHxrne-Ut2ZlXrzdWfLtj7_d3b6iEqn9abVVFGmic4RhwsSUvIua5JyYxSlRjKICcDKPcCqcZMWANG6pTA6Dqz2uhU57nYS2n5gsXzX-16752x1eCaT-V-KoTqiF0dsSsB1Yw9FW7mQjOo4b_jX-lzVf4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Moser, Pascal ; Bläsing, Jürgen ; Dadgar, Armin ; Hempel, Thomas ; Christen, Jürgen ; Krost, Alois</creator><creatorcontrib>Moser, Pascal ; Bläsing, Jürgen ; Dadgar, Armin ; Hempel, Thomas ; Christen, Jürgen ; Krost, Alois</creatorcontrib><description>The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary electron microscope, Nomarski microscope and various X-ray diffraction techniques. Samples grown with AlInN layers obtaining a slightly lower and a higher indium concentration compared to the lattice matched samples show a strong degradation of the AlInN/GaN double layers. The degradation of the multilayer structures both on a microscopic and on a macroscopic scale is investigated, revealing a much stronger roughening of the AlInN surfaces with higher indium concentration. The roughening is attributed to a Stranski--Krastanov transition from two-dimensional to three-dimensional growth mode.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.50.031002</identifier><language>eng</language><publisher>The Japan Society of Applied Physics</publisher><ispartof>Japanese Journal of Applied Physics, 2011-03, Vol.50 (3), p.031002-031002-6</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c321t-30f49f4133cd4a9746a2e47084e019b514d175fe0e9c640ecd7fcec6c885b99f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids></links><search><creatorcontrib>Moser, Pascal</creatorcontrib><creatorcontrib>Bläsing, Jürgen</creatorcontrib><creatorcontrib>Dadgar, Armin</creatorcontrib><creatorcontrib>Hempel, Thomas</creatorcontrib><creatorcontrib>Christen, Jürgen</creatorcontrib><creatorcontrib>Krost, Alois</creatorcontrib><title>Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors</title><title>Japanese Journal of Applied Physics</title><description>The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary electron microscope, Nomarski microscope and various X-ray diffraction techniques. Samples grown with AlInN layers obtaining a slightly lower and a higher indium concentration compared to the lattice matched samples show a strong degradation of the AlInN/GaN double layers. The degradation of the multilayer structures both on a microscopic and on a macroscopic scale is investigated, revealing a much stronger roughening of the AlInN surfaces with higher indium concentration. The roughening is attributed to a Stranski--Krastanov transition from two-dimensional to three-dimensional growth mode.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNqFj81PhDAQxRujibh69czZBHaGToEecaPrbnA1fpxJt7QbDAJpSdT_XjZ49_TmvZk3yY-xa4QYkfhyuy2eYwExcARITliAnLKIIBWnLJgSjEgmyTm78P5jsqkgDFj2OjrjffhiWvWtxqbvwqYLy_4rmhZqGot20-2Wa7ULb506HMLHxrne-Ut2ZlXrzdWfLtj7_d3b6iEqn9abVVFGmic4RhwsSUvIua5JyYxSlRjKICcDKPcCqcZMWANG6pTA6Dqz2uhU57nYS2n5gsXzX-16752x1eCaT-V-KoTqiF0dsSsB1Yw9FW7mQjOo4b_jX-lzVf4</recordid><startdate>20110301</startdate><enddate>20110301</enddate><creator>Moser, Pascal</creator><creator>Bläsing, Jürgen</creator><creator>Dadgar, Armin</creator><creator>Hempel, Thomas</creator><creator>Christen, Jürgen</creator><creator>Krost, Alois</creator><general>The Japan Society of Applied Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20110301</creationdate><title>Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors</title><author>Moser, Pascal ; Bläsing, Jürgen ; Dadgar, Armin ; Hempel, Thomas ; Christen, Jürgen ; Krost, Alois</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c321t-30f49f4133cd4a9746a2e47084e019b514d175fe0e9c640ecd7fcec6c885b99f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Moser, Pascal</creatorcontrib><creatorcontrib>Bläsing, Jürgen</creatorcontrib><creatorcontrib>Dadgar, Armin</creatorcontrib><creatorcontrib>Hempel, Thomas</creatorcontrib><creatorcontrib>Christen, Jürgen</creatorcontrib><creatorcontrib>Krost, Alois</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Moser, Pascal</au><au>Bläsing, Jürgen</au><au>Dadgar, Armin</au><au>Hempel, Thomas</au><au>Christen, Jürgen</au><au>Krost, Alois</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2011-03-01</date><risdate>2011</risdate><volume>50</volume><issue>3</issue><spage>031002</spage><epage>031002-6</epage><pages>031002-031002-6</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary electron microscope, Nomarski microscope and various X-ray diffraction techniques. Samples grown with AlInN layers obtaining a slightly lower and a higher indium concentration compared to the lattice matched samples show a strong degradation of the AlInN/GaN double layers. The degradation of the multilayer structures both on a microscopic and on a macroscopic scale is investigated, revealing a much stronger roughening of the AlInN surfaces with higher indium concentration. The roughening is attributed to a Stranski--Krastanov transition from two-dimensional to three-dimensional growth mode.</abstract><pub>The Japan Society of Applied Physics</pub><doi>10.1143/JJAP.50.031002</doi></addata></record> |
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title | Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors |
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