Stress Relaxation in Low-Strain AlInN/GaN Bragg Mirrors

The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary ele...

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Veröffentlicht in:Japanese Journal of Applied Physics 2011-03, Vol.50 (3), p.031002-031002-6
Hauptverfasser: Moser, Pascal, Bläsing, Jürgen, Dadgar, Armin, Hempel, Thomas, Christen, Jürgen, Krost, Alois
Format: Artikel
Sprache:eng
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Zusammenfassung:The structural behaviour of lattice mismatched AlInN/GaN-based multilayer structures grown on sapphire substrates by metal organic vapour phase epitaxy has been studied in-situ by curvature and real-surface temperature measurement, and ex-situ by atomic force microscope, field-emission secondary electron microscope, Nomarski microscope and various X-ray diffraction techniques. Samples grown with AlInN layers obtaining a slightly lower and a higher indium concentration compared to the lattice matched samples show a strong degradation of the AlInN/GaN double layers. The degradation of the multilayer structures both on a microscopic and on a macroscopic scale is investigated, revealing a much stronger roughening of the AlInN surfaces with higher indium concentration. The roughening is attributed to a Stranski--Krastanov transition from two-dimensional to three-dimensional growth mode.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.50.031002