Formation of Macropore and Three-Dimensional Nanorod Array in p-Type Silicon

We carried out a study on the change in pore wall thickness depending on the current density in p-type silicon. We attempted the formation of a uniform macropore or nanorod array with a high aspect ratio in p-type silicon by electrochemical etching through the optimization of the hydrogen fluoride (...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2010-05, Vol.49 (5), p.056503-056503-4
Hauptverfasser:	Kim, Kang-Pil, Li, Shiqiang, Lyu, Hong-Kun, Woo, Sung-Ho, Lim, Sang Kyoo, Chang, Daeic, Oh, Hwa Sub, Hwang, Dae-Kue
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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