Hafnium Oxide Film Etching Using Hydrogen Chloride Gas

Hafnium Oxide Film Etching Using Hydrogen Chloride Gas

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Veröffentlicht in:Japanese Journal of Applied Physics 2009-12, Vol.48 (12), p.125503, Article 125503
Hauptverfasser: Habuka, Hitoshi, Yamaji, Masahiko, Kobori, Yoshitsugu, Horii, Sadayoshi, Kunii, Yasuo
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container_issue 12
container_start_page 125503
container_title Japanese Journal of Applied Physics
container_volume 48
creator Habuka, Hitoshi
Yamaji, Masahiko
Kobori, Yoshitsugu
Horii, Sadayoshi
Kunii, Yasuo
description
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Hafnium Oxide Film Etching Using Hydrogen Chloride Gas
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