A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing

A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Japanese Journal of Applied Physics 2007-03, Vol.46 (3R), p.977
Hauptverfasser: Yoshida, Masato, Koyama, Naoyuki, Ashizawa, Toranosuke, Sakata, Yoshihisa, Imamura, Hayao
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 3R
container_start_page 977
container_title Japanese Journal of Applied Physics
container_volume 46
creator Yoshida, Masato
Koyama, Naoyuki
Ashizawa, Toranosuke
Sakata, Yoshihisa
Imamura, Hayao
description
doi_str_mv 10.1143/JJAP.46.977
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_46_977</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_46_977</sourcerecordid><originalsourceid>FETCH-LOGICAL-c787-9febfdc0b1c47c0c4e0d96c7b0f3a494daa602bf98ab82c69c65f5d2a5c73da73</originalsourceid><addsrcrecordid>eNotkEtLxDAAhIMoWFdP_oHc3dQkTZPmWIuvZbULFjyWNA830ockLLr_3hY9zQwMw_ABcE1wSgjLbjebcpcynkohTkBCMiYQwzw_BQnGlCAmKT0HFzF-zpHnjCTgvYSv9htWNvjDgO5UtAY2NowqHGH9442Fb_0hhON6rjQeUlhDDtfQTQFWezt4rXr0YvVejYuFu6n3ce_Hj0tw5lQf7dW_rkDzcN9UT2hbPz5X5RZpUQgkne2c0bgjmgmNNbPYSK5Fh12mmGRGKY5p52ShuoJqLjXPXW6oyrXIjBLZCtz8zeowxRisa7-CH-bzLcHtgqRdkLSMtzOS7BeiplMG</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Yoshida, Masato ; Koyama, Naoyuki ; Ashizawa, Toranosuke ; Sakata, Yoshihisa ; Imamura, Hayao</creator><creatorcontrib>Yoshida, Masato ; Koyama, Naoyuki ; Ashizawa, Toranosuke ; Sakata, Yoshihisa ; Imamura, Hayao</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.46.977</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2007-03, Vol.46 (3R), p.977</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c787-9febfdc0b1c47c0c4e0d96c7b0f3a494daa602bf98ab82c69c65f5d2a5c73da73</citedby><cites>FETCH-LOGICAL-c787-9febfdc0b1c47c0c4e0d96c7b0f3a494daa602bf98ab82c69c65f5d2a5c73da73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Yoshida, Masato</creatorcontrib><creatorcontrib>Koyama, Naoyuki</creatorcontrib><creatorcontrib>Ashizawa, Toranosuke</creatorcontrib><creatorcontrib>Sakata, Yoshihisa</creatorcontrib><creatorcontrib>Imamura, Hayao</creatorcontrib><title>A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNotkEtLxDAAhIMoWFdP_oHc3dQkTZPmWIuvZbULFjyWNA830ockLLr_3hY9zQwMw_ABcE1wSgjLbjebcpcynkohTkBCMiYQwzw_BQnGlCAmKT0HFzF-zpHnjCTgvYSv9htWNvjDgO5UtAY2NowqHGH9442Fb_0hhON6rjQeUlhDDtfQTQFWezt4rXr0YvVejYuFu6n3ce_Hj0tw5lQf7dW_rkDzcN9UT2hbPz5X5RZpUQgkne2c0bgjmgmNNbPYSK5Fh12mmGRGKY5p52ShuoJqLjXPXW6oyrXIjBLZCtz8zeowxRisa7-CH-bzLcHtgqRdkLSMtzOS7BeiplMG</recordid><startdate>20070301</startdate><enddate>20070301</enddate><creator>Yoshida, Masato</creator><creator>Koyama, Naoyuki</creator><creator>Ashizawa, Toranosuke</creator><creator>Sakata, Yoshihisa</creator><creator>Imamura, Hayao</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20070301</creationdate><title>A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing</title><author>Yoshida, Masato ; Koyama, Naoyuki ; Ashizawa, Toranosuke ; Sakata, Yoshihisa ; Imamura, Hayao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c787-9febfdc0b1c47c0c4e0d96c7b0f3a494daa602bf98ab82c69c65f5d2a5c73da73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yoshida, Masato</creatorcontrib><creatorcontrib>Koyama, Naoyuki</creatorcontrib><creatorcontrib>Ashizawa, Toranosuke</creatorcontrib><creatorcontrib>Sakata, Yoshihisa</creatorcontrib><creatorcontrib>Imamura, Hayao</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yoshida, Masato</au><au>Koyama, Naoyuki</au><au>Ashizawa, Toranosuke</au><au>Sakata, Yoshihisa</au><au>Imamura, Hayao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2007-03-01</date><risdate>2007</risdate><volume>46</volume><issue>3R</issue><spage>977</spage><pages>977-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.1143/JJAP.46.977</doi></addata></record>
fulltext fulltext
identifier ISSN: 0021-4922
ispartof Japanese Journal of Applied Physics, 2007-03, Vol.46 (3R), p.977
issn 0021-4922
1347-4065
language eng
recordid cdi_crossref_primary_10_1143_JJAP_46_977
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title A New Cerium-Based Ternary Oxide Slurry, CeTi 2 O 6 , for Chemical-Mechanical Polishing
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T16%3A06%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20New%20Cerium-Based%20Ternary%20Oxide%20Slurry,%20CeTi%202%20O%206%20,%20for%20Chemical-Mechanical%20Polishing&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Yoshida,%20Masato&rft.date=2007-03-01&rft.volume=46&rft.issue=3R&rft.spage=977&rft.pages=977-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.46.977&rft_dat=%3Ccrossref%3E10_1143_JJAP_46_977%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true