High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 µs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition
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Veröffentlicht in: | Japanese Journal of Applied Physics 2007-11, Vol.46 (11R), p.7198 |
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container_issue | 11R |
container_start_page | 7198 |
container_title | Japanese Journal of Applied Physics |
container_volume | 46 |
creator | Ohdaira, Keisuke Nishizaki, Shogo Endo, Yohei Fujiwara, Tomoko Usami, Noritaka Nakajima, Kazuo Matsumura, Hideki |
description | |
doi_str_mv | 10.1143/JJAP.46.7198 |
format | Article |
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ispartof | Japanese Journal of Applied Physics, 2007-11, Vol.46 (11R), p.7198 |
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language | eng |
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source | Institute of Physics Journals |
title | High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 µs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition |
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