Grain Enlargement of Polycrystalline Silicon by Multipulse Excimer Laser Annealing: Role of Hydrogen

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Veröffentlicht in:Japanese Journal of Applied Physics 2006-04, Vol.45 (4R), p.2726
Hauptverfasser: Kawamoto, Naoya, Masuda, Atsushi, Matsuo, Naoto, Seri, Yasuhiro, Nishimori, Toshimasa, Kitamon, Yoshitaka, Matsumura, Hideki, Hamada, Hiroki, Miyoshi, Tadaki
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container_title Japanese Journal of Applied Physics
container_volume 45
creator Kawamoto, Naoya
Masuda, Atsushi
Matsuo, Naoto
Seri, Yasuhiro
Nishimori, Toshimasa
Kitamon, Yoshitaka
Matsumura, Hideki
Hamada, Hiroki
Miyoshi, Tadaki
description
doi_str_mv 10.1143/JJAP.45.2726
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Grain Enlargement of Polycrystalline Silicon by Multipulse Excimer Laser Annealing: Role of Hydrogen
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