Real-Time Observation of Fractional-Order X-ray Reflection Profiles of InP(001) During Step-Flow Growth

Fractional-order X-ray reflection profiles of (2×1)-InP(001) have been observed for the first time during step-flow growth of metalorganic chemical vapor deposition. Changes of the profiles have revealed that the coverage of (2 ×1) structures during the growth depends on the flow rates of indium and...

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Veröffentlicht in:Japanese Journal of Applied Physics 2005-01, Vol.44 (1L), p.L144
Hauptverfasser: Fujikawa, Seiji, Kawamura, Tomoaki, Bhunia, Satyaban, Watanabe, Yoshio, Tokushima, Kenshi, Tsusaka, Yoshiyuki, Kagoshima, Yasushi, Matsui, Junji
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Sprache:eng
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Zusammenfassung:Fractional-order X-ray reflection profiles of (2×1)-InP(001) have been observed for the first time during step-flow growth of metalorganic chemical vapor deposition. Changes of the profiles have revealed that the coverage of (2 ×1) structures during the growth depends on the flow rates of indium and phosphorus sources. After stopping the growth, a slow recovery of peak intensity was observed with a time constant of lager than 1 min which corresponds to the residence time of indium atoms on the surface.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.44.L144