Fabrication of Indium Phosphide Compound Photonic Crystal by Hydrogen Iodide/Xenon Inductively Coupled Plasma Etching

Fabrication of Indium Phosphide Compound Photonic Crystal by Hydrogen Iodide/Xenon Inductively Coupled Plasma Etching

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Veröffentlicht in:Japanese Journal of Applied Physics 2004-11, Vol.43 (No. 11A), p.L1400-L1402
Hauptverfasser: Fujita, Masayuki, Sugitatsu, Atsushi, Uesugi, Toshitsugu, Noda, Susumu
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container_end_page L1402
container_issue No. 11A
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container_title Japanese Journal of Applied Physics
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creator Fujita, Masayuki
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Noda, Susumu
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ispartof Japanese Journal of Applied Physics, 2004-11, Vol.43 (No. 11A), p.L1400-L1402
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Fabrication of Indium Phosphide Compound Photonic Crystal by Hydrogen Iodide/Xenon Inductively Coupled Plasma Etching
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