Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy

Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy

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Veröffentlicht in:Japanese Journal of Applied Physics 2004-10, Vol.43 (10), p.6974-6977
Hauptverfasser: Noda, Suguru, Tsumura, Takeshi, Fukuhara, Jota, Yoda, Takashi, Komiyama, Hiroshi, Shimogaki, Yukihiro
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container_issue 10
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container_title Japanese Journal of Applied Physics
container_volume 43
creator Noda, Suguru
Tsumura, Takeshi
Fukuhara, Jota
Yoda, Takashi
Komiyama, Hiroshi
Shimogaki, Yukihiro
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doi_str_mv 10.1143/JJAP.43.6974
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title Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy
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