CH 4 /N 2 Plasma Etching for Organic Low- k Dielectric Material

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Veröffentlicht in:	Japanese Journal of Applied Physics 2002-09, Vol.41 (Part 1, No. 9), p.5775-5781
Hauptverfasser:	Nakagawa, Hideo, Morikawa, Yasuhiro, Takano, Midori, Tamaoka, Eiji, Hayashi, Toshio
Format:	Artikel
Sprache:	eng
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source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title	CH 4 /N 2 Plasma Etching for Organic Low- k Dielectric Material
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