Epitaxial Growth of γ-In 2 Se 3 Films by Molecular Beam Epitaxy

Epitaxial growth of γ-In 2 Se 3 film was investigated by molecular beam epitaxy (MBE). γ-In 2 Se 3 epiataxial films with a defect wurtzite structure were successfully grown on GaAs(111)B substrates for the first time. The crystal structure of the γ-In 2 Se 3 epitaxial film was determined by X-ray di...

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Veröffentlicht in:Japanese Journal of Applied Physics 2001-02, Vol.40 (2R), p.509
Hauptverfasser: Tomohiko Ohtsuka, Tomohiko Ohtsuka, Kazuyuki Nakanishi, Kazuyuki Nakanishi, Tamotsu Okamoto, Tamotsu Okamoto, Akira Yamada, Akira Yamada, Makoto Konagai, Makoto Konagai, Uwe Jahn, Uwe Jahn
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Sprache:eng
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Zusammenfassung:Epitaxial growth of γ-In 2 Se 3 film was investigated by molecular beam epitaxy (MBE). γ-In 2 Se 3 epiataxial films with a defect wurtzite structure were successfully grown on GaAs(111)B substrates for the first time. The crystal structure of the γ-In 2 Se 3 epitaxial film was determined by X-ray diffraction (XRD) and atomic force microscopy (AFM). It was found that γ-In 2 Se 3 epitaxial films exhibit a vacancy-ordered crystal structure and that sharrow hexagonal cone structures were formed on the film surface. Furthermore, optical properties of the γ-In 2 Se 3 epitaxial films were investigated by spatially resolved cathodoluminescence (CL).
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.40.509