Effect of Interfacial Carbide Layer on the Raman Spectra in Chemical-Vapor Deposited Diamond Films
Diamond films were deposited on the p -Si (100) substrates by hot filament chemical vapor deposition (HFCVD). Then, the Raman spectra of the diamond films with the substrate removed and with a carbon layer deposited on the back of the film were compared. We also investigated the characteristics of t...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1999-02, Vol.38 (2R), p.777 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Diamond films were deposited on the
p
-Si (100) substrates by hot filament chemical vapor
deposition (HFCVD). Then, the Raman spectra of the diamond films with the substrate removed and
with a carbon layer deposited on the back of the film were compared. We also investigated the
characteristics of the spectra along the direction of the film thickness. The results showed that the
Raman spectra were affected not only by the properties of the diamond films but also by the
interfacial silicon carbide layer, due to the high optical transmittance of diamond. The residual
stresses in the film showed a nonuniform distribution along the film thickness. However, the residual
stress on the top surface of the film almost reflected the average
value for the total film thickness. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.38.777 |