Development of Highly Accurate X-Ray Mask with High-Density Patterns

Highly accurate X-ray masks with high-density patterns have been newly developed. SiC film is used as a membrane and Ta film deposited by electron cyclotron resonance (ECR) sputtering method is used as an absorber. Ru film is deposited as an intermediate layer between the membrane and the absorber t...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1999-12, Vol.38 (12S), p.7071
Hauptverfasser:	Shimada, Masaru, Tsuchizawa, Tai, Uchiyama, Shingo, Ohkubo, Takashi, Itabashi, Seiichi, Okada, Ikuo, Ono, Toshiro, Oda, Masatoshi
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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