Low-Temperature Crystallization of Sol-Gel-Derived Pb(Zr, Ti)O 3 Thin Films

Sol-gel derived Pb(Zr,Ti)O 3 capacitors were prepared by low-pressure annealing and the two-step annealing techniques. Well-saturated D – E hysteresis was obtained at 650°C with low-pressure rapid thermal annealing. The low-pressure first anneal lowered the crystallization temperature of sol-gel-der...

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Veröffentlicht in:Japanese Journal of Applied Physics 1999-09, Vol.38 (9S), p.5346
Hauptverfasser: Yoshikazu Fujimori, Yoshikazu Fujimori, Takashi Nakamura, Takashi Nakamura, Hidemi Takasu, Hidemi Takasu
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Sprache:eng
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Zusammenfassung:Sol-gel derived Pb(Zr,Ti)O 3 capacitors were prepared by low-pressure annealing and the two-step annealing techniques. Well-saturated D – E hysteresis was obtained at 650°C with low-pressure rapid thermal annealing. The low-pressure first anneal lowered the crystallization temperature of sol-gel-derived Pb(Zr,Ti)O 3 thin films. Highly reliable and low-voltage operation Pb(Zr,Ti)O 3 capacitors were obtained using a two-step annealing techniques under low-pressure at 550°C.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.38.5346