Thickness Dependence of Ferroelectricity in Heteroepitaxial BaTiO 3 Thin Film Capacitors

Heteroepitaxial BaTiO 3 films of various thicknesses ranging from 12 nm to 79 nm were prepared on SrRuO 3 /SrTiO 3 substrates by radio-frequency magnetron sputtering employing a two-step deposition technique, and the crystallographic and ferroelectric properties of the heteroepitaxial films were eva...

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Veröffentlicht in:Japanese Journal of Applied Physics 1999-09, Vol.38 (9S), p.5305
Hauptverfasser: Naoko Yanase, Naoko Yanase, Kazuhide Abe, Kazuhide Abe, Noburu Fukushima, Noburu Fukushima, Takashi Kawakubo, Takashi Kawakubo
Format: Artikel
Sprache:eng
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Zusammenfassung:Heteroepitaxial BaTiO 3 films of various thicknesses ranging from 12 nm to 79 nm were prepared on SrRuO 3 /SrTiO 3 substrates by radio-frequency magnetron sputtering employing a two-step deposition technique, and the crystallographic and ferroelectric properties of the heteroepitaxial films were evaluated. A ferroelectric hysteresis loop was clearly observed in the heteroepitaxial BaTiO 3 films even when the thickness was reduced to 12 nm, probably due to improved crystallinity at the interface between the ferroelectric film and the electrodes through optimization of the preparation technique. The observation of hysteresis at the temperature of 200°C was explained in terms of modification of the Curie temperature from the inherent 130°C to far above 200°C by lattice misfit strain. A possible relationship between the artificially raised Curie temperature and the limited thickness dependence of ferroelectricity was discussed.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.38.5305