Reproducible Growth of Metalorganic Chemical Vapor Deposition Derived YBa 2 Cu 3 O x Thin Films Using Ultrasonic Gas Concentration Analyzer

Reproducible Growth of Metalorganic Chemical Vapor Deposition Derived YBa 2 Cu 3 O x Thin Films Using Ultrasonic Gas Concentration Analyzer

We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa 2 Cu 3 O x (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM)...

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Veröffentlicht in:Japanese Journal of Applied Physics 1999-08, Vol.38 (8R), p.4727
Hauptverfasser: Shuu'ichirou Yamamoto, Shuu'ichirou Yamamoto, Kouji Nagata, Kouji Nagata, Satoshi Sugai, Satoshi Sugai, Akio Sengoku, Akio Sengoku, Yasunari Matsukawa, Yasunari Matsukawa, Takeo Hattori, Takeo Hattori, Shunri Oda, Shunri Oda
Format: Artikel
Sprache:eng
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Zusammenfassung:We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa 2 Cu 3 O x (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM) compounds has been clearly observed. We have proposed a feedback system using an ultrasonic concentration analyzer and two sets of mass flow controllers for each precursor, and have proven the validity of the operation.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.38.4727