Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors

Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors

We have designed and started the fabrication of 3-mirror ring-field projection optics for extreme ultraviolet lithography (EUVL) and an experimental exposure system using the projection optics, which enable a large-field (30 mm×20 mm), high-resolution (

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Veröffentlicht in:Japanese Journal of Applied Physics 1998, Vol.37 (12S), p.6750
Hauptverfasser: Murakami, Katsuhiko, Oshino, Tetsuya, Kinoshita, Hiroo, Watanabe, Takeo, Niibe, Masato, Ito, Masaaki, Oizumi, Hiroaki, Yamanashi, Hiromasa
Format: Artikel
Sprache:eng
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Zusammenfassung:We have designed and started the fabrication of 3-mirror ring-field projection optics for extreme ultraviolet lithography (EUVL) and an experimental exposure system using the projection optics, which enable a large-field (30 mm×20 mm), high-resolution (
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.6750