Effect of Strong Borrmann Absorption on X-Ray Fluorescence Yield Curves

The Ga K X-ray fluorescence yield from GaAs was measured around the 200 reflection peak in the symmetric Laue case, by tuning the incident X-ray energy from a synchrotron radiation source between the K-absorption edges of Ga and As. It was found that the fluorescence yields from the crystal surface...

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Veröffentlicht in:Japanese Journal of Applied Physics 1998, Vol.37 (7R), p.4014
Hauptverfasser: Riichirou Negishi, Riichirou Negishi, Tomoe Fukamachi, Tomoe Fukamachi, Zhangcheng Xu, Zhangcheng Xu, Masami Yoshizawa, Masami Yoshizawa, Isao Matsumoto, Isao Matsumoto, Takaaki Kawamura, Takaaki Kawamura, Tetsuo Nakajima, Tetsuo Nakajima
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Sprache:eng
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Zusammenfassung:The Ga K X-ray fluorescence yield from GaAs was measured around the 200 reflection peak in the symmetric Laue case, by tuning the incident X-ray energy from a synchrotron radiation source between the K-absorption edges of Ga and As. It was found that the fluorescence yields from the crystal surface become minimum at the exact Bragg angle, when the diffraction is induced only by χ h i , i.e., the imaginary part of the Fourier coefficient of the X-ray polarizability (χ h r being the real part). In the case of |χ h r |=|χ h i |, which occurs at two energy points, both yield curves are asymmetrical with respect to the exact Bragg angle and their asymmetries are opposite to each other.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.4014